Highly selective and vertical etch of silicon dioxide using ruthenium films as an etch mask
نویسندگان
چکیده
منابع مشابه
Growth and Etch Rate Study of Low Temperature Anodic Silicon Dioxide Thin Films
Silicon dioxide (SiO2) thin films are most commonly used insulating films in the fabrication of silicon-based integrated circuits (ICs) and microelectromechanical systems (MEMS). Several techniques with different processing environments have been investigated to deposit silicon dioxide films at temperatures down to room temperature. Anodic oxidation of silicon is one of the low temperature proc...
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ژورنال
عنوان ژورنال: Journal of Vacuum Science & Technology A
سال: 2021
ISSN: 0734-2101,1520-8559
DOI: 10.1116/6.0001030